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Könyv címe:

Plasma-processing-induced Damage Of Thin Dielectric Films

LAP LAMBERT Academic Publishing (30.11.2012 )

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ISBN-13:

978-3-8433-8758-3

ISBN-10:
3843387583
EAN:
9783843387583
Könyv nyelve:
angol
Ismertető:
In semiconductor industry, material property degradation due to process is a critical factor that limits the device performance. Process-induced damage on a variety of dielectric materials is discussed and measured. Results from various metrologies are packaged and correlated into systematic theory. Charge-induced, chemical, and physical damage source in plasma process environment is identified and optimized. Two sample types of dielectrics are investigated: high-k dielectrics used in device technology and low-k dielectrics as observed in interconnect technology.
Kiadó:
LAP LAMBERT Academic Publishing
Weboldal:
https://www.lap-publishing.com/
Szerezte:
He Ren
Oldalszám:
188
Kiadja:
30.11.2012
Raktárkészlet:
Raktáron
Kategória:
Technológia
Ár:
68,00 €
Kulcsszavak:
Dielectric Material, Plasma Process, Process-induced Damage, Interconnect Technology

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