Bookcover of Sputter Deposition
Booktitle:

Sputter Deposition

Sputter Coating

TurbsPublishing (2013-08-15 )

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ISBN-13:

978-613-9-04508-2

ISBN-10:
6139045088
EAN:
9786139045082
Book language:
English
Blurb/Shorttext:
Please note that the content of this book primarily consists of articles available from Wikipedia or other free sources online. Sputter deposition is a physical vapor deposition (PVD) method of depositing thin films by sputtering, that is ejecting, material from a "target," that is source, which then deposits onto a "substrate," such as a silicon wafer. Resputtering is re-emission of the deposited material during the deposition process by ion or atom bombardment. Sputtered atoms ejected from the target have a wide energy distribution, typically up to tens of eV (100,000 K). The sputtered ions (typically only a small fraction — order 1% — of the ejected particles are ionized) can ballistically fly from the target in straight lines and impact energetically on the substrates or vacuum chamber (causing resputtering).
Publishing house:
TurbsPublishing
Website:
http://www.betascript-publishing.com
Edited by:
Erik Yama Étienne
Number of pages:
120
Published on:
2013-08-15
Stock:
Available
Category:
Technology
Price:
29.00 €
Keywords:
Coating, physical, sputter, Vapour, Depositing, Resputtering

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